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2000 – 2009
- 2007
[j5]Cédric Leyris, Frédéric Martinez
, Alain Hoffmann, M. Valenza, J. C. Vildeuil:
N-MOSFET oxide trap characterization induced by nitridation process using RTS noise analysis. Microelectron. Reliab. 47(1): 41-45 (2007)- [j4]G. Néau, Frédéric Martinez, M. Valenza, J. C. Vildeuil, E. Vincent, Frédéric Boeuf, F. Payet, K. Rochereau:
Impact of strained-channel n-MOSFETs with a SiGe virtual substrate on dielectric interface quality evaluated by low frequency noise measurements. Microelectron. Reliab. 47(4-5): 567-572 (2007) - [j3]Cédric Leyris, Frédéric Martinez, M. Valenza, Alain Hoffmann, J. C. Vildeuil:
Random telegraph signal: A sensitive and nondestructive tool for gate oxide single trap characterization. Microelectron. Reliab. 47(4-5): 573-576 (2007) - 2005
- [j2]P. Benoit, Jérémy Raoult, C. Delseny, Fabien Pascal, L. Snadny, J. C. Vildeuil, M. Marin, B. Martinet, D. Cottin, Olivier Noblanc:
Dc and low frequency noise analysis of hot-carrier induced degradation of low complexity 0.13 mum CMOS bipolar transistors. Microelectron. Reliab. 45(9-11): 1800-1806 (2005) - 2004
- [j1]M. Marin, Y. Akue Allogo, M. de Murcia, P. Llinares, J. C. Vildeuil:
Low frequency noise characterization in 0.13 mum p-MOSFETs. Impact of scaled-down 0.25, 0.18 and 0.13 mum technologies on 1/f noise. Microelectron. Reliab. 44(7): 1077-1085 (2004)
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