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ORCIDFrank Wessely
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2010 – 2019
- 2018
[c9]Tillmann Krauss, Frank Wessely, Udo Schwalke:
Reconfigurable electrostatically doped 2.5-gate planar field-effect transistors for dopant-free CMOS. DTIS 2018: 1-4- 2017
- [c8]Tillmann Krauss, Frank Wessely, Udo Schwalke:
Fabrication and simulation of electrically reconfigurable dual metal-gate planar field-effect transistors for dopant-free CMOS. DTIS 2017: 1-6 - 2016
- [c7]Tillmann Krauss, Frank Wessely, Udo Schwalke:
Electrically reconfigurable dual metal-gate planar field-effect transistor for dopant-free CMOS. SSD 2016: 681-686 - 2014
- [c6]Tillmann Krauss, Frank Wessely, Udo Schwalke:
An electrostatically doped planar device concept. DTIS 2014: 1-4 - 2013
- [j1]Frank Wessely, Tillmann Krauss, Udo Schwalke:
Reconfigurable CMOS with undoped silicon nanowire midgap Schottky-barrier FETs. Microelectron. J. 44(12): 1072-1076 (2013) - [c5]Udo Schwalke, Frank Wessely, Tillmann Krauss:
Simulation and experimental verification: Dopant-free Si-nanowire CMOS technology on silicon-on-insulator material. IDT 2013: 1-6 - 2012
- [c4]Martin Keyn, Pia Juliane Wessely, Frank Wessely, Lorraine Rispal, Johannes Palm, Udo Schwalke:
Feasibility study on in situ CCVD grown CNTs for field-effect power device applications. DTIS 2012: 1-3 - [c3]Udo Schwalke, Pia Juliane Wessely, Frank Wessely, Martin Keyn, Lorraine Rispal:
Nanoelectronics: From silicon to graphene. DTIS 2012: 1-3 - [c2]Frank Wessely, Tillmann Krauss, Udo Schwalke:
Dopant-free CMOS: A new device concept. DTIS 2012: 1-3 - [c1]Pia Juliane Wessely, Frank Wessely, Emrah Birinci, Udo Schwalke, Bernadette Riedinger:
On/off-current ratios of transfer-free bilayer graphene FETs as a function of temperature. DTIS 2012: 1-3
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