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2020 – today
- 2024
[c3]Jungchul Lee, EC Kwon, SH Yoon, R. G. Oh, S. Y. Park, S. H. Youn, K. R. Choi, T. W. Kim, M. C. Kim, J. H. Park, Y. W. Ko, Y. D. Kim, J. S. Moon, H. A. Park, K. O. Hong, J. Y. Yang, J. Y. Yoon, J. M. Yoon, J. M. Lee, J. H. Kim, H. Y. Yoo, S. J. Kim, N.-H. Lee, S. H. Lee, K. S. Kwon, I. G. Jung, S. Y. Lee, H.-J. Kim, Sangwoo Pae:
Virtual FA Methodology for DRAM: Real-Time Analysis and Risk Assessment Method Using Telemetry. IRPS 2024: 1-7- 2023
- [c2]Sungmock Ha, S. Lee, G. H. Bae, D. S. Lee, S. H. Kim, B. W. Woo, N.-H. Lee, Y. S. Lee, S. Pae:
Reliability Characterization of HBM featuring $\text{HK}+\text{MG}$ Logic Chip with Multi-stacked DRAMs. IRPS 2023: 1-7 - [c1]S. Lee, N.-H. Lee, K. W. Lee, J. H. Kim, J. H. Jin, Y. S. Lee, Y. C. Hwang, H. S. Kim, S. Pae:
Development and Product Reliability Characterization of Advanced High Speed 14nm DDR5 DRAM with On-die ECC. IRPS 2023: 1-4
2010 – 2019
- 2012
- [j1]Seonhaeng Lee, Dongwoo Kim
, Cheolgyu Kim, N.-H. Lee, Gang-Jun Kim, Chiho Lee, Jeongsoo Park, Bongkoo Kang:
Effect of electron-electron scattering at an elevated temperature on device lifetime of nanoscale nMOSFETs. Microelectron. Reliab. 52(9-10): 1905-1908 (2012)
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