{"id":"https://openalex.org/W2740204001","doi":"https://doi.org/10.1145/3084683","title":"Two-Stage Layout Decomposition for Hybrid E-Beam and Triple Patterning Lithography","display_name":"Two-Stage Layout Decomposition for Hybrid E-Beam and Triple Patterning Lithography","publication_year":2017,"publication_date":"2017-08-01","ids":{"openalex":"https://openalex.org/W2740204001","doi":"https://doi.org/10.1145/3084683","mag":"2740204001"},"language":"en","primary_location":{"is_oa":false,"landing_page_url":"https://doi.org/10.1145/3084683","pdf_url":null,"source":{"id":"https://openalex.org/S105046310","display_name":"ACM Transactions on Design Automation of Electronic Systems","issn_l":"1084-4309","issn":["1084-4309","1557-7309"],"is_oa":false,"is_in_doaj":false,"is_indexed_in_scopus":true,"is_core":true,"host_organization":"https://openalex.org/P4310319798","host_organization_name":"Association for Computing Machinery","host_organization_lineage":["https://openalex.org/P4310319798"],"host_organization_lineage_names":["Association for Computing Machinery"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false},"type":"article","type_crossref":"journal-article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5012196564","display_name":"Xingquan Li","orcid":"https://orcid.org/0000-0002-7145-9391"},"institutions":[{"id":"https://openalex.org/I80947539","display_name":"Fuzhou University","ror":"https://ror.org/011xvna82","country_code":"CN","type":"funder","lineage":["https://openalex.org/I80947539"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xingquan Li","raw_affiliation_strings":["Fuzhou University, China"],"affiliations":[{"raw_affiliation_string":"Fuzhou University, China","institution_ids":["https://openalex.org/I80947539"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100413098","display_name":"Wenxing Zhu","orcid":"https://orcid.org/0000-0002-8698-0024"},"institutions":[{"id":"https://openalex.org/I80947539","display_name":"Fuzhou University","ror":"https://ror.org/011xvna82","country_code":"CN","type":"funder","lineage":["https://openalex.org/I80947539"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Wenxing Zhu","raw_affiliation_strings":["Fuzhou University, China"],"affiliations":[{"raw_affiliation_string":"Fuzhou University, China","institution_ids":["https://openalex.org/I80947539"]}]}],"institution_assertions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.531,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.514116,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":82,"max":83},"biblio":{"volume":"23","issue":"1","first_page":"1","last_page":"23"},"is_retracted":false,"is_paratext":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9989,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9989,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9982,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10996","display_name":"Computational Geometry and Mesh Generation","score":0.9962,"subfield":{"id":"https://openalex.org/subfields/1704","display_name":"Computer Graphics and Computer-Aided Design"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6786336},{"id":"https://openalex.org/C124681953","wikidata":"https://www.wikidata.org/wiki/Q339062","display_name":"Decomposition","level":2,"score":0.6642264},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.62712044},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.4619494},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.33548245},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.2393898},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17827016},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.13195848},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"is_oa":false,"landing_page_url":"https://doi.org/10.1145/3084683","pdf_url":null,"source":{"id":"https://openalex.org/S105046310","display_name":"ACM Transactions on Design Automation of Electronic Systems","issn_l":"1084-4309","issn":["1084-4309","1557-7309"],"is_oa":false,"is_in_doaj":false,"is_indexed_in_scopus":true,"is_core":true,"host_organization":"https://openalex.org/P4310319798","host_organization_name":"Association for Computing Machinery","host_organization_lineage":["https://openalex.org/P4310319798"],"host_organization_lineage_names":["Association for Computing Machinery"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.64,"id":"https://metadata.un.org/sdg/9","display_name":"Industry, innovation and infrastructure"}],"grants":[{"funder":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China","award_id":"61672005 and 11331003"}],"datasets":[],"versions":[],"referenced_works_count":23,"referenced_works":["https://openalex.org/W1971739315","https://openalex.org/W1990485341","https://openalex.org/W2001584749","https://openalex.org/W2016074831","https://openalex.org/W2025251804","https://openalex.org/W2025304056","https://openalex.org/W2025899115","https://openalex.org/W2030087828","https://openalex.org/W2035656956","https://openalex.org/W2035821057","https://openalex.org/W2053210666","https://openalex.org/W2059176270","https://openalex.org/W2063642376","https://openalex.org/W2073102055","https://openalex.org/W2081206460","https://openalex.org/W2093576521","https://openalex.org/W2118752641","https://openalex.org/W2124224379","https://openalex.org/W2143286762","https://openalex.org/W2173707186","https://openalex.org/W2342679249","https://openalex.org/W2426216145","https://openalex.org/W4238204060"],"related_works":["https://openalex.org/W4321454142","https://openalex.org/W4307818291","https://openalex.org/W4226323632","https://openalex.org/W41803155","https://openalex.org/W3144174107","https://openalex.org/W3033444048","https://openalex.org/W2792297505","https://openalex.org/W2376495194","https://openalex.org/W2062151620","https://openalex.org/W2026197969"],"abstract_inverted_index":{"Hybrid":[0],"e-beam":[1,60,82,145],"lithography":[2,7,64],"(EBL)":[3],"and":[4,28,61,83,90,144,160,179],"triple":[5,62],"patterning":[6,63],"(TPL)":[8],"are":[9,115,132],"advanced":[10],"technologies":[11],"for":[12,34,57,97],"the":[13,24,35,58,66,73,81,91,112,118,123,128,138,153,170],"manufacture":[14],"of":[15,26,65,111,127,137,172],"integrated":[16],"circuits.":[17],"We":[18],"propose":[19,52],"a":[20,42,53],"technology":[21],"that":[22],"combines":[23],"advantages":[25],"EBL":[27],"TPL,":[29],"which":[30],"is":[31,41],"more":[32],"promising":[33],"pattern":[36],"product":[37],"industry.":[38],"Layout":[39],"decomposition":[40,55,69,174],"crucial":[43],"step":[44],"in":[45],"this":[46,49],"technology.":[47],"In":[48],"article,":[50],"we":[51,76,151],"two-stage":[54],"flow":[56],"hybrid":[59],"general":[67],"layout":[68],"(HETLD)":[70],"problem.":[71,106],"At":[72,122],"first":[74,129],"stage,":[75,125],"formulate":[77],"two":[78,113],"optimization":[79],"problems:":[80],"stitch-aware":[84],"TPL":[85],"mask":[86,100],"assignment":[87,101],"(ESTMA)":[88],"problem":[89,140,154],"extended":[92],"minimum":[93],"weight":[94],"dominating":[95],"set":[96],"R":[98,103,181],"4":[99,104,182],"(MDS":[102],"MA)":[105],"Binary":[107],"linear":[108],"program":[109],"formulations":[110],"problems":[114,131],"solved":[116],"by":[117,141,156],"cutting":[119],"plane":[120],"approach.":[121],"second":[124],"solutions":[126,136],"stage":[130],"legalized":[133],"to":[134],"feasible":[135],"HETLD":[139],"stitch":[142],"insertion":[143],"shot.":[146],"To":[147],"speed":[148],"up":[149],"decomposition,":[150],"reduce":[152],"size":[155],"removing":[157],"some":[158,161],"vertices":[159],"minor":[162],"conflict":[163],"edges":[164],"before":[165],"decomposition.":[166],"Experimental":[167],"results":[168],"show":[169],"effectiveness":[171],"our":[173],"methods":[175],"based":[176],"on":[177],"ESTMA":[178],"MDS":[180],"MA.":[183]},"abstract_inverted_index_v3":null,"cited_by_api_url":"https://api.openalex.org/works?filter=cites:W2740204001","counts_by_year":[{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":4},{"year":2019,"cited_by_count":1}],"updated_date":"2025-03-15T21:27:31.706071","created_date":"2017-08-08"}