{"id":"https://openalex.org/W4386242015","doi":"https://doi.org/10.1109/tcad.2023.3309745","title":"RL-OPC: Mask Optimization With Deep Reinforcement Learning","display_name":"RL-OPC: Mask Optimization With Deep Reinforcement Learning","publication_year":2023,"publication_date":"2023-08-29","ids":{"openalex":"https://openalex.org/W4386242015","doi":"https://doi.org/10.1109/tcad.2023.3309745"},"language":"en","primary_location":{"is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcad.2023.3309745","pdf_url":null,"source":{"id":"https://openalex.org/S100835903","display_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","issn_l":"0278-0070","issn":["0278-0070","1937-4151"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false},"type":"article","type_crossref":"journal-article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5055355549","display_name":"Xiaoxiao Liang","orcid":"https://orcid.org/0000-0003-4691-3940"},"institutions":[{"id":"https://openalex.org/I200769079","display_name":"Hong Kong University of Science and Technology","ror":"https://ror.org/00q4vv597","country_code":"HK","type":"education","lineage":["https://openalex.org/I200769079"]},{"id":"https://openalex.org/I889458895","display_name":"University of Hong Kong","ror":"https://ror.org/02zhqgq86","country_code":"HK","type":"education","lineage":["https://openalex.org/I889458895"]}],"countries":["HK"],"is_corresponding":false,"raw_author_name":"Xiaoxiao Liang","raw_affiliation_strings":["Microelectronics Thrust, The Hong Kong University of Science and Technology (Guangzhou), Guangzhou, China"],"affiliations":[{"raw_affiliation_string":"Microelectronics Thrust, The Hong Kong University of Science and Technology (Guangzhou), Guangzhou, China","institution_ids":["https://openalex.org/I200769079","https://openalex.org/I889458895"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081893914","display_name":"Yikang Ouyang","orcid":null},"institutions":[{"id":"https://openalex.org/I200769079","display_name":"Hong Kong University of Science and Technology","ror":"https://ror.org/00q4vv597","country_code":"HK","type":"education","lineage":["https://openalex.org/I200769079"]},{"id":"https://openalex.org/I889458895","display_name":"University of Hong Kong","ror":"https://ror.org/02zhqgq86","country_code":"HK","type":"education","lineage":["https://openalex.org/I889458895"]}],"countries":["HK"],"is_corresponding":false,"raw_author_name":"Yikang Ouyang","raw_affiliation_strings":["Microelectronics Thrust, The Hong Kong University of Science and Technology (Guangzhou), Guangzhou, China"],"affiliations":[{"raw_affiliation_string":"Microelectronics Thrust, The Hong Kong University of Science and Technology (Guangzhou), Guangzhou, China","institution_ids":["https://openalex.org/I200769079","https://openalex.org/I889458895"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100642435","display_name":"Haoyu Yang","orcid":"https://orcid.org/0000-0002-4709-0061"},"institutions":[{"id":"https://openalex.org/I4210127875","display_name":"Nvidia (United States)","ror":"https://ror.org/03jdj4y14","country_code":"US","type":"company","lineage":["https://openalex.org/I4210127875"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Haoyu Yang","raw_affiliation_strings":["Design Automation Research Group, Nvidia, Austin, TX, USA"],"affiliations":[{"raw_affiliation_string":"Design Automation Research Group, Nvidia, Austin, TX, USA","institution_ids":["https://openalex.org/I4210127875"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051340429","display_name":"Bei Yu","orcid":"https://orcid.org/0000-0001-6406-4810"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"CN","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Bei Yu","raw_affiliation_strings":["Department of Computer Science and Engineering, The Chinese University of Hong Kong, Hong Kong, SAR"],"affiliations":[{"raw_affiliation_string":"Department of Computer Science and Engineering, The Chinese University of Hong Kong, Hong Kong, SAR","institution_ids":["https://openalex.org/I177725633"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5071995111","display_name":"Yuzhe Ma","orcid":"https://orcid.org/0000-0002-3612-4182"},"institutions":[{"id":"https://openalex.org/I200769079","display_name":"Hong Kong University of Science and Technology","ror":"https://ror.org/00q4vv597","country_code":"HK","type":"education","lineage":["https://openalex.org/I200769079"]},{"id":"https://openalex.org/I889458895","display_name":"University of Hong Kong","ror":"https://ror.org/02zhqgq86","country_code":"HK","type":"education","lineage":["https://openalex.org/I889458895"]}],"countries":["HK"],"is_corresponding":false,"raw_author_name":"Yuzhe Ma","raw_affiliation_strings":["Microelectronics Thrust, The Hong Kong University of Science and Technology (Guangzhou), Guangzhou, China"],"affiliations":[{"raw_affiliation_string":"Microelectronics Thrust, The Hong Kong University of Science and Technology (Guangzhou), Guangzhou, China","institution_ids":["https://openalex.org/I200769079","https://openalex.org/I889458895"]}]}],"institution_assertions":[],"countries_distinct_count":3,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.404,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.696435,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":90},"biblio":{"volume":"43","issue":"1","first_page":"340","last_page":"351"},"is_retracted":false,"is_paratext":false,"primary_topic":{"id":"https://openalex.org/T11159","display_name":"Manufacturing Process and Optimization","score":0.9909,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11159","display_name":"Manufacturing Process and Optimization","score":0.9909,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11451","display_name":"Advanced Machining and Optimization Techniques","score":0.9737,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9531,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[],"concepts":[{"id":"https://openalex.org/C97541855","wikidata":"https://www.wikidata.org/wiki/Q830687","display_name":"Reinforcement learning","level":2,"score":0.6893391},{"id":"https://openalex.org/C67203356","wikidata":"https://www.wikidata.org/wiki/Q1321905","display_name":"Reinforcement","level":2,"score":0.56990033},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4835715},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.4178722},{"id":"https://openalex.org/C15744967","wikidata":"https://www.wikidata.org/wiki/Q9418","display_name":"Psychology","level":0,"score":0.27417788},{"id":"https://openalex.org/C77805123","wikidata":"https://www.wikidata.org/wiki/Q161272","display_name":"Social psychology","level":1,"score":0.09875873}],"mesh":[],"locations_count":1,"locations":[{"is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcad.2023.3309745","pdf_url":null,"source":{"id":"https://openalex.org/S100835903","display_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","issn_l":"0278-0070","issn":["0278-0070","1937-4151"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Reduced inequalities","score":0.7,"id":"https://metadata.un.org/sdg/10"}],"grants":[{"funder":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China","award_id":"62204066"}],"datasets":[],"versions":[],"referenced_works_count":24,"referenced_works":["https://openalex.org/W1995125212","https://openalex.org/W2129996279","https://openalex.org/W2146918190","https://openalex.org/W2194775991","https://openalex.org/W2344299637","https://openalex.org/W2909831073","https://openalex.org/W2910093824","https://openalex.org/W2945764596","https://openalex.org/W2971516606","https://openalex.org/W3006089892","https://openalex.org/W3012499251","https://openalex.org/W3092645103","https://openalex.org/W3112693398","https://openalex.org/W3169517138","https://openalex.org/W3203170932","https://openalex.org/W3216969643","https://openalex.org/W32403112","https://openalex.org/W4235262418","https://openalex.org/W4237591687","https://openalex.org/W4238829881","https://openalex.org/W4241870777","https://openalex.org/W4254271781","https://openalex.org/W4288079630","https://openalex.org/W4298857966"],"related_works":["https://openalex.org/W4310083477","https://openalex.org/W2920061524","https://openalex.org/W2748952813","https://openalex.org/W2328553770","https://openalex.org/W2145821588","https://openalex.org/W2107890255","https://openalex.org/W2106552856","https://openalex.org/W2086122291","https://openalex.org/W2038908348","https://openalex.org/W1977959518"],"abstract_inverted_index":{"Mask":[0],"optimization":[1,72],"is":[2,26],"a":[3,58,70,104],"vital":[4],"step":[5],"in":[6,11],"the":[7,18,80,88,99],"VLSI":[8],"manufacturing":[9],"process":[10],"advanced":[12],"technology":[13],"nodes.":[14],"As":[15],"one":[16],"of":[17],"most":[19],"representative":[20],"techniques,":[21],"optical":[22],"proximity":[23],"correction":[24],"(OPC)":[25],"widely":[27],"applied":[28,43],"to":[29],"enhance":[30],"printability.":[31],"Since":[32],"conventional":[33],"OPC":[34],"methods":[35],"consume":[36],"prohibitive":[37],"computational":[38],"overhead,":[39],"recent":[40],"research":[41],"has":[42],"machine":[44],"learning":[45,54,66,90],"techniques":[46],"for":[47,61,74,93],"efficient":[48],"mask":[49,94],"optimization.":[50],"However,":[51],"existing":[52],"discriminative":[53],"models":[55,67],"rely":[56],"on":[57],"given":[59],"dataset":[60],"supervised":[62],"training,":[63],"and":[64,119],"generative":[65],"usually":[68],"leverage":[69],"proxy":[71],"objective":[73,101],"end-to-end":[75],"learning,":[76],"which":[77,96],"may":[78],"limit":[79],"feasibility.":[81],"In":[82],"this":[83],"article,":[84],"we":[85],"pioneer":[86],"introducing":[87],"reinforcement":[89],"(RL)":[91],"model":[92],"optimization,":[95],"directly":[97],"optimizes":[98],"preferred":[100],"without":[102],"leveraging":[103],"differentiable":[105],"proxy.":[106],"Intensive":[107],"experiments":[108],"show":[109],"that":[110],"our":[111],"method":[112],"outperforms":[113],"state-of-the-art":[114],"solutions,":[115],"including":[116],"academic":[117],"approaches":[118],"commercial":[120],"toolkits.":[121]},"cited_by_api_url":"https://api.openalex.org/works?filter=cites:W4386242015","counts_by_year":[{"year":2024,"cited_by_count":4}],"updated_date":"2025-01-05T07:07:42.949242","created_date":"2023-08-30"}