乐胖代购免代理版

{"id":"https://openalex.org/W2083874129","doi":"https://doi.org/10.1002/qre.1149","title":"A case study on modeling and optimizing photolithography stage of semiconductor fabrication process","display_name":"A case study on modeling and optimizing photolithography stage of semiconductor fabrication process","publication_year":2010,"publication_date":"2010-09-26","ids":{"openalex":"https://openalex.org/W2083874129","doi":"https://doi.org/10.1002/qre.1149","mag":"2083874129"},"language":"en","primary_location":{"is_oa":false,"landing_page_url":"https://doi.org/10.1002/qre.1149","pdf_url":null,"source":{"id":"https://openalex.org/S165633816","display_name":"Quality and Reliability Engineering International","issn_l":"0748-8017","issn":["0748-8017","1099-1638"],"is_oa":false,"is_in_doaj":false,"is_indexed_in_scopus":true,"is_core":true,"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false},"type":"article","type_crossref":"journal-article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100359572","display_name":"Hyunjin Kim","orcid":"https://orcid.org/0000-0003-2461-9935"},"institutions":[{"id":"https://openalex.org/I123900574","display_name":"Pohang University of Science and Technology","ror":"https://ror.org/04xysgw12","country_code":"KR","type":"education","lineage":["https://openalex.org/I123900574"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hyun\u2010Jin Kim","raw_affiliation_strings":["Department of Industrial and Management Engineering, Pohang University of Science and Technology, Pohang, Korea."],"affiliations":[{"raw_affiliation_string":"Department of Industrial and Management Engineering, Pohang University of Science and Technology, Pohang, Korea.","institution_ids":["https://openalex.org/I123900574"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032057236","display_name":"Kwang\u2010Jae Kim","orcid":null},"institutions":[{"id":"https://openalex.org/I123900574","display_name":"Pohang University of Science and Technology","ror":"https://ror.org/04xysgw12","country_code":"KR","type":"education","lineage":["https://openalex.org/I123900574"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kwang\u2010Jae Kim","raw_affiliation_strings":["Department of Industrial and Management Engineering, Pohang University of Science and Technology, Pohang, Republic of Korea"],"affiliations":[{"raw_affiliation_string":"Department of Industrial and Management Engineering, Pohang University of Science and Technology, Pohang, Republic of Korea","institution_ids":["https://openalex.org/I123900574"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5070732005","display_name":"Doh\u2010Soon Kwak","orcid":null},"institutions":[{"id":"https://openalex.org/I123900574","display_name":"Pohang University of Science and Technology","ror":"https://ror.org/04xysgw12","country_code":"KR","type":"education","lineage":["https://openalex.org/I123900574"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Doh\u2010Soon Kwak","raw_affiliation_strings":["Department of Industrial and Management Engineering, Pohang University of Science and Technology, Pohang, Korea."],"affiliations":[{"raw_affiliation_string":"Department of Industrial and Management Engineering, Pohang University of Science and Technology, Pohang, Korea.","institution_ids":["https://openalex.org/I123900574"]}]}],"institution_assertions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":4330,"currency":"USD","value_usd":4330,"provenance":"doaj"},"apc_paid":null,"fwci":1.025,"has_fulltext":true,"fulltext_origin":"ngrams","cited_by_count":10,"citation_normalized_percentile":{"value":0.733434,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":84,"max":85},"biblio":{"volume":"26","issue":"7","first_page":"765","last_page":"774"},"is_retracted":false,"is_paratext":false,"primary_topic":{"id":"https://openalex.org/T11798","display_name":"Optimal Experimental Design Methods","score":0.9998,"subfield":{"id":"https://openalex.org/subfields/1803","display_name":"Management Science and Operations Research"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},"topics":[{"id":"https://openalex.org/T11798","display_name":"Optimal Experimental Design Methods","score":0.9998,"subfield":{"id":"https://openalex.org/subfields/1803","display_name":"Management Science and Operations Research"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},{"id":"https://openalex.org/T10848","display_name":"Advanced Multi-Objective Optimization Algorithms","score":0.9982,"subfield":{"id":"https://openalex.org/subfields/1703","display_name":"Computational Theory and Mathematics"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11443","display_name":"Advanced Statistical Process Monitoring","score":0.9966,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.79024607},{"id":"https://openalex.org/keywords/process-capability","display_name":"Process capability","score":0.41226}],"concepts":[{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.9171335},{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.79024607},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6593482},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.56494695},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.43280703},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.4316455},{"id":"https://openalex.org/C2779530757","wikidata":"https://www.wikidata.org/wiki/Q1207505","display_name":"Quality (philosophy)","level":2,"score":0.42350924},{"id":"https://openalex.org/C91439571","wikidata":"https://www.wikidata.org/wiki/Q1279773","display_name":"Process capability","level":3,"score":0.41226},{"id":"https://openalex.org/C200601418","wikidata":"https://www.wikidata.org/wiki/Q2193887","display_name":"Reliability engineering","level":1,"score":0.36467528},{"id":"https://openalex.org/C115952470","wikidata":"https://www.wikidata.org/wiki/Q332172","display_name":"Process optimization","level":2,"score":0.3555131},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.35107073},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.34098607},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.32402045},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3065086},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.22692361},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.1599116},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C111472728","wikidata":"https://www.wikidata.org/wiki/Q9471","display_name":"Epistemology","level":1,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C87717796","wikidata":"https://www.wikidata.org/wiki/Q146326","display_name":"Environmental engineering","level":1,"score":0.0},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"is_oa":false,"landing_page_url":"https://doi.org/10.1002/qre.1149","pdf_url":null,"source":{"id":"https://openalex.org/S165633816","display_name":"Quality and Reliability Engineering International","issn_l":"0748-8017","issn":["0748-8017","1099-1638"],"is_oa":false,"is_in_doaj":false,"is_indexed_in_scopus":true,"is_core":true,"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.53,"id":"https://metadata.un.org/sdg/9","display_name":"Industry, innovation and infrastructure"}],"grants":[],"datasets":[],"versions":[],"referenced_works_count":17,"referenced_works":["https://openalex.org/W156495478","https://openalex.org/W1585841143","https://openalex.org/W1607019360","https://openalex.org/W1968098666","https://openalex.org/W1992025965","https://openalex.org/W1999974018","https://openalex.org/W2003547149","https://openalex.org/W2017422910","https://openalex.org/W2018901843","https://openalex.org/W2100851179","https://openalex.org/W2109364787","https://openalex.org/W2124273156","https://openalex.org/W2130899984","https://openalex.org/W2159347337","https://openalex.org/W2163114907","https://openalex.org/W2284967628","https://openalex.org/W607975737"],"related_works":["https://openalex.org/W4390482314","https://openalex.org/W2529250647","https://openalex.org/W2472231262","https://openalex.org/W2379276625","https://openalex.org/W2379171104","https://openalex.org/W2365269228","https://openalex.org/W2128344089","https://openalex.org/W2108148093","https://openalex.org/W2083874129","https://openalex.org/W2004754773"],"abstract_inverted_index":{"Abstract":[0],"Photolithography":[1],"in":[2,28,81],"the":[3,8,13,29,42,52,59,75,101,110,117],"semiconductor":[4,16,69],"fabrication":[5,19],"process":[6,20,24],"is":[7,21,46,104],"core":[9],"stage":[10,54],"that":[11,25,123],"determines":[12],"quality":[14,30,66],"of":[15,31,41,62,68,78,100,112],"chips.":[17,70],"The":[18,71,97],"a":[22,47,65],"batch":[23],"causes":[26],"variation":[27],"chips;":[32],"thus,":[33],"uniformity":[34,57],"has":[35],"always":[36],"been":[37],"an":[38],"important":[39],"goal":[40],"process.":[43],"This":[44],"research":[45],"case":[48,72],"study":[49,73],"on":[50,116],"optimizing":[51],"photolithography":[53,82],"to":[55,106,109],"improve":[56],"and":[58],"target":[60],"achievement":[61],"critical":[63],"dimension,":[64],"measure":[67],"finds":[74],"optimal":[76,102],"setting":[77,103],"input":[79],"variables":[80],"by":[83,93],"applying":[84],"multivariate":[85],"normal":[86],"linear":[87],"modeling":[88],"with":[89],"operational":[90],"data":[91],"obtained":[92],"sampling":[94],"during":[95],"manufacturing.":[96],"predicted":[98],"performance":[99],"found":[105],"be":[107,125],"close":[108],"limit":[111],"improvement":[113],"estimated":[114],"based":[115],"model.":[118],"For":[119],"practitioners,":[120],"several":[121],"issues":[122],"can":[124],"considered":[126],"for":[127],"better":[128],"optimization":[129],"are":[130],"also":[131],"provided.":[132],"Copyright":[133],"\u00a9":[134],"2010":[135],"John":[136],"Wiley":[137],"&":[138],"Sons,":[139],"Ltd.":[140]},"cited_by_api_url":"https://api.openalex.org/works?filter=cites:W2083874129","counts_by_year":[{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":3},{"year":2021,"cited_by_count":1},{"year":2012,"cited_by_count":2}],"updated_date":"2025-01-20T19:14:28.815010","created_date":"2016-06-24"}