{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,1,24]],"date-time":"2024-01-24T02:22:49Z","timestamp":1706062969507},"reference-count":21,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","issue":"2","license":[{"start":{"date-parts":[[2017,2,1]],"date-time":"2017-02-01T00:00:00Z","timestamp":1485907200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/ieeexplore.ieee.org\/Xplorehelp\/downloads\/license-information\/IEEE.html"}],"funder":[{"DOI":"10.13039\/501100001809","name":"National Natural Science Foundation of China","doi-asserted-by":"publisher","id":[{"id":"10.13039\/501100001809","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IEEE Trans. Comput."],"published-print":{"date-parts":[[2017,2,1]]},"DOI":"10.1109\/tc.2016.2582154","type":"journal-article","created":{"date-parts":[[2016,6,16]],"date-time":"2016-06-16T19:53:42Z","timestamp":1466106822000},"page":"285-298","source":"Crossref","is-referenced-by-count":18,"title":["Discrete Relaxation Method for Triple Patterning Lithography Layout Decomposition"],"prefix":"10.1109","volume":"66","author":[{"given":"Xingquan","family":"Li","sequence":"first","affiliation":[]},{"given":"Ziran","family":"Zhu","sequence":"additional","affiliation":[]},{"given":"Wenxing","family":"Zhu","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2014.2387840"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2013.6691114"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1145\/2429384.2429396"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1145\/2717764.2717768"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1117\/12.793116"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2013.2288678"},{"key":"ref16","doi-asserted-by":"publisher","DOI":"10.1145\/2463209.2488818"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2015.2401571"},{"key":"ref18","year":"0"},{"key":"ref19","doi-asserted-by":"publisher","DOI":"10.1007\/978-3-540-24838-5_24"},{"key":"ref4","article-title":"Lithography 2009: Overview of opportunities","author":"borodovsky","year":"2009","journal-title":"Semicon West"},{"key":"ref3","year":"0"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2009.2035577"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2008.4681616"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2011.6105298"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1145\/1687399.1687511"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1016\/S0166-218X(00)00307-3"},{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1007\/978-1-4614-0769-0_6"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2011.2179039"},{"key":"ref20","article-title":"Triple\/quadruple pattering layout decomposition via novel linear programming and\n iterative rounding","author":"lin","year":"0","journal-title":"Proc SPIE Des -Process-Tech Co-optim Manufacturability X"},{"key":"ref21","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2013.6691115"}],"container-title":["IEEE Transactions on Computers"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/12\/7815462\/07493680.pdf?arnumber=7493680","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2022,1,12]],"date-time":"2022-01-12T16:12:32Z","timestamp":1642003952000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/7493680\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2017,2,1]]},"references-count":21,"journal-issue":{"issue":"2"},"URL":"https:\/\/doi.org\/10.1109\/tc.2016.2582154","relation":{},"ISSN":["0018-9340"],"issn-type":[{"value":"0018-9340","type":"print"}],"subject":[],"published":{"date-parts":[[2017,2,1]]}}}