{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,10,29]],"date-time":"2024-10-29T15:40:42Z","timestamp":1730216442090,"version":"3.28.0"},"reference-count":12,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2017,9]]},"DOI":"10.1109\/ecoc.2017.8345913","type":"proceedings-article","created":{"date-parts":[[2018,5,3]],"date-time":"2018-05-03T18:11:42Z","timestamp":1525371102000},"page":"1-3","source":"Crossref","is-referenced-by-count":4,"title":["Resonant Wavelength Variation Modelling for Microring Resonators based on Fabrication Deviation Analysis"],"prefix":"10.1109","author":[{"given":"Tsuyoshi","family":"Horikawa","sequence":"first","affiliation":[]},{"given":"Daisuke","family":"Shimura","sequence":"additional","affiliation":[]},{"given":"Hiroyuki","family":"Takahashi","sequence":"additional","affiliation":[]},{"given":"Jun","family":"Ushida","sequence":"additional","affiliation":[]},{"given":"Yohei","family":"Sobu","sequence":"additional","affiliation":[]},{"given":"Akemi","family":"Shiina","sequence":"additional","affiliation":[]},{"given":"Masatoshi","family":"Tokushima","sequence":"additional","affiliation":[]},{"given":"Seok-Hwan","family":"Jeong","sequence":"additional","affiliation":[]},{"given":"Keizo","family":"Kinoshita","sequence":"additional","affiliation":[]},{"given":"Tohru","family":"Mogami","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1049\/el.2013.0206"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1016\/j.mee.2015.10.019"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1109\/ECOC.2015.7341725"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1002\/lpor.201100017"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1016\/j.mee.2015.11.015"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1364\/OL.39.003702"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1557\/mrc.2015.84"},{"key":"ref8","article-title":"Low-loss, flat-topped and spectrally uniform silicon-nanowire-based 5th-order CROW fabricated by ArF-immersion lithography process on a 300-mm SOI wafer","volume":"21","author":"jeong","year":"2012","journal-title":"Opt Express"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1109\/JPHOT.2011.2140367"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1109\/IEDM.2013.6724623"},{"key":"ref9","article-title":"Impact of fabrication nonuniformity on chip-scale silicon photonic integrated circuits","author":"chrostowski","year":"2014","journal-title":"Proc OSA OFC"},{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1109\/MCOM.2013.6476868"}],"event":{"name":"2017 European Conference on Optical Communication (ECOC)","start":{"date-parts":[[2017,9,17]]},"location":"Gothenburg","end":{"date-parts":[[2017,9,21]]}},"container-title":["2017 European Conference on Optical Communication (ECOC)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/8345373\/8345823\/08345913.pdf?arnumber=8345913","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2019,9,9]],"date-time":"2019-09-09T21:15:05Z","timestamp":1568063705000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/8345913\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2017,9]]},"references-count":12,"URL":"https:\/\/doi.org\/10.1109\/ecoc.2017.8345913","relation":{},"subject":[],"published":{"date-parts":[[2017,9]]}}}